Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Scanning probe lithography of self-assembled monolayers

Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on...

Self-Assembled Monolayers As Models For Silica

Large-area nanopatterning of self-assembled monolayers of alkanethiolates by interferometric lithography.

We demonstrate that interferometric lithography provides a fast, simple approach to the production of patterns in self-assembled monolayers (SAMs) with high resolution over square centimeter areas. As a proof of principle, two-beam interference patterns, formed using light from a frequency-doubled argon ion laser (244 nm), were used to pattern methyl-terminated SAMs on gold, facilitating the in...

Catalytic probe lithography: catalyst-functionalized scanning probes as nanopens for nanofabrication on self-assembled monolayers.

This article describes the use of scanning catalytic probe lithography for nanofabrication of patterns on self-assembled monolayers (SAMs) of reactive adsorbates. Catalytic writing was carried out by scanning over bis(omega-tert-butyldimethyl-siloxyundecyl)disulfide SAMs using 2-mercapto-5-benzimidazole sulfonic acid-functionalized gold-coated AFM tips. The acidic tips induced local hydrolysis ...

Approach to EUV Lithography Simulation